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Evaluation of ozonated water spray for resist cleaning applications

dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorLux, Marcel
dc.contributor.authorClaes, Martine
dc.contributor.authorVan Hoeymissen, Jan
dc.contributor.authorConard, Thierry
dc.contributor.authorWorth, W.
dc.contributor.authorLagrange, Sébastien
dc.contributor.authorBergman, E.
dc.contributor.authorJassal, A. S.
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-14T12:48:05Z
dc.date.available2021-10-14T12:48:05Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4254
dc.sourceIIOimport
dc.titleEvaluation of ozonated water spray for resist cleaning applications
dc.typeProceedings paper
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorLux, Marcel
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage391
dc.source.endpage398
dc.source.conferenceCleaning Technology in Semiconductor Device Manufacturing. Proceedings of the 6th International Symposium
dc.source.conferencedate17/10/1999
dc.source.conferencelocationHonolulu, HI USA
imec.availabilityPublished - open access
imec.internalnotesElectrochemical Society Proceedings; Vol. PV 99-36


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