Impact of CVD chemistry on band alignment at the MoS2/SiO2 interface

Tummala, P. P.; Delie, Gilles; Cataldo, A.; Ghomi, S.; Martella, C.; Ferrini, G.; Molle, A.; Lamperti, A.; Afanasiev, Valeri

doi:10.1016/j.sse.2023.108782

Publication:

Impact of CVD chemistry on band alignment at the MoS2/SiO2 interface

Date

2023

Journal article

https://doi.org/10.1016/j.sse.2023.108782

Simple item page Full metadata Statistics

Files

Accepted version 314.53 KB

Author(s)

;

;

;

;

;

;

;

;

Journal

SOLID-STATE ELECTRONICS

Statistics

174 since deposited on 2023-10-27

13last month

1last week

Acq. date: 2026-02-24

825 since deposited on 2023-10-27

1last month

1last week

Acq. date: 2026-02-24

Impact of CVD chemistry on band alignment at the MoS2/SiO2 interface

Date

Files

Author(s)

Journal

Abstract

Description

Statistics

Downloads

Views

Citations

Statistics

Downloads

Views

Citations