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Synthesis of CoxFe1-xSi2 with High-Dose Ion Implantation and Reactive Codeposition Epitaxy

dc.contributor.authorVantomme, Andre
dc.contributor.authorWu, Ming Fang
dc.contributor.authorDegroote, S.
dc.contributor.authorDekoster, J.
dc.contributor.authorLangouche, G.
dc.contributor.authorTavares, J.
dc.contributor.authorBender, Hugo
dc.date.accessioned2021-09-29T12:51:40Z
dc.date.available2021-09-29T12:51:40Z
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/432
dc.sourceIIOimport
dc.titleSynthesis of CoxFe1-xSi2 with High-Dose Ion Implantation and Reactive Codeposition Epitaxy
dc.typeOral presentation
dc.contributor.imecauthorVantomme, Andre
dc.contributor.imecauthorBender, Hugo
dc.source.peerreviewno
dc.source.conference10th Conference on Ion Implantation Technology
dc.source.conferencedate13/06/1994
dc.source.conferencelocationCatania Italy
imec.availabilityPublished - imec
imec.internalnotesProceedings to be publ. 1995


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