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Validation of imaging benefits of Dual Monopole exposures

dc.contributor.authorBrunner, Timothy A.
dc.contributor.authorFranke, Joern-Holger
dc.contributor.authorTruffert, Vincent
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorRispens, Gijsbert
dc.contributor.authorDuriau, Edouard
dc.contributor.authorvan Dijk, Andre
dc.contributor.authorTabery, Cyrus
dc.contributor.authorRio, David
dc.contributor.authorde Poortere, Etienne
dc.contributor.authorvan de Kerkhof, Mark
dc.contributor.authorHendrickx, Eric
dc.date.accessioned2024-03-04T14:23:42Z
dc.date.available2024-01-13T17:48:01Z
dc.date.available2024-03-04T14:23:42Z
dc.date.issued2023
dc.identifier.isbn978-1-5106-6748-8
dc.identifier.issn0277-786X
dc.identifier.otherWOS:001125089900005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/43411.2
dc.sourceWOS
dc.titleValidation of imaging benefits of Dual Monopole exposures
dc.typeProceedings paper
dc.contributor.imecauthorFranke, Joern-Holger
dc.contributor.imecauthorTruffert, Vincent
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecFranke, Joern-Holger::0000-0002-3571-1633
dc.contributor.orcidimecTruffert, Vincent::0000-0001-7851-830X
dc.contributor.orcidimecDe Bisschop, Peter::0000-0002-8297-5076
dc.contributor.orcidimecHendrickx, Eric::0000-0003-2516-0417
dc.identifier.doi10.1117/12.2685543
dc.identifier.eisbn978-1-5106-6749-5
dc.source.numberofpages9
dc.source.peerreviewyes
dc.source.beginpageArt. 1275006
dc.source.conferenceInternational Conference on Extreme Ultraviolet Lithography
dc.source.conferencedateOCT 02-05, 2023
dc.source.conferencelocationMonterey
dc.source.journalProceedings of SPIE
dc.source.volume12750
imec.availabilityPublished - imec


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220.500.12860/43411.2*2024-03-04T14:21:41Zvalidation by library/open access desk
120.500.12860/434112024-01-13T17:48:01Z

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