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Physical and electrical characterization of silsesquioxane-based ultra-low k dielectric films

dc.contributor.authorAlves Donaton, Ricardo
dc.contributor.authorIacopi, Francesca
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorShamiryan, Denis
dc.contributor.authorCoenegrachts, Bart
dc.contributor.authorStruyf, Herbert
dc.contributor.authorLepage, Muriel
dc.contributor.authorMeuris, Marc
dc.contributor.authorVan Hove, Marleen
dc.contributor.authorGray, William
dc.contributor.authorMeynen, Herman
dc.contributor.authorDe Roest, David
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-14T12:55:25Z
dc.date.available2021-10-14T12:55:25Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4345
dc.sourceIIOimport
dc.titlePhysical and electrical characterization of silsesquioxane-based ultra-low k dielectric films
dc.typeProceedings paper
dc.contributor.imecauthorCoenegrachts, Bart
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorDe Roest, David
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage93
dc.source.endpage95
dc.source.conferenceProceedings of the IEEE 2000 International Interconnect Technology Conference
dc.source.conferencedate5/06/2000
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - open access


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