Show simple item record

Analysis of the etch rate limiting steps in dry etching of tungsten in fluorine containing plasmas

dc.contributor.authorVerdonck, Patrick
dc.contributor.authorSwart, J.
dc.contributor.authorBrasseur, Guy
dc.contributor.authorDe Geyter, Pascal
dc.date.accessioned2021-09-29T12:51:47Z
dc.date.available2021-09-29T12:51:47Z
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/434
dc.sourceIIOimport
dc.titleAnalysis of the etch rate limiting steps in dry etching of tungsten in fluorine containing plasmas
dc.typeProceedings paper
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage437
dc.source.endpage448
dc.source.conference185th Electrochemical Society Spring Meeting: 10th Symposium on Plasma Processing
dc.source.conferencedate22/05/1994
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - open access
imec.internalnotesElectrochemical Society Proceedings; Vol. 94-20


Files in this item

Thumbnail
Name:
429.pdf
Size:
323.3Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record