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The etching mechanisms of SiO2 in hydrofluoric acid
Publication:
The etching mechanisms of SiO2 in hydrofluoric acid
Date
1994
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Verhaverbeke, Steven
;
Teerlinck, Ivo
;
Vinckier, Chris
;
Stevens, G.
;
Cartuyvels, Rudi
;
Heyns, Marc
Journal
Journal of the Electrochemical Society
Abstract
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2017
since deposited on 2021-09-29
437
item.page.metrics.field.last-week
Acq. date: 2025-10-24
Citations
Metrics
Views
2017
since deposited on 2021-09-29
437
item.page.metrics.field.last-week
Acq. date: 2025-10-24
Citations