Improving OPC Model Accuracy of Dry Resist for Low k1 EUV Patterning
dc.contributor.author | Xu, Dongbo | |
dc.contributor.author | Gillijns, Werner | |
dc.contributor.author | Wu, Stewart | |
dc.contributor.author | Jambaldinni, Shruti | |
dc.contributor.author | Kam, Benjamin | |
dc.contributor.author | De Silva, Anuja | |
dc.contributor.author | Fenger, Germain | |
dc.date.accessioned | 2024-08-26T08:29:32Z | |
dc.date.available | 2024-06-15T17:25:04Z | |
dc.date.available | 2024-08-26T08:29:32Z | |
dc.date.issued | 2024 | |
dc.identifier.isbn | 978-1-5106-7214-7 | |
dc.identifier.issn | 0277-786X | |
dc.identifier.other | WOS:001224292100018 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/44037.2 | |
dc.source | WOS | |
dc.title | Improving OPC Model Accuracy of Dry Resist for Low k1 EUV Patterning | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Gillijns, Werner | |
dc.contributor.orcidimec | Gillijns, Werner::0000-0002-2430-7360 | |
dc.date.embargo | 2024-04-10 | |
dc.identifier.doi | 10.1117/12.3010127 | |
dc.identifier.eisbn | 978-1-5106-7215-4 | |
dc.source.numberofpages | 9 | |
dc.source.peerreview | yes | |
dc.source.beginpage | Art. 129540L | |
dc.source.conference | Conference on DTCO and Computational Patterning III | |
dc.source.conferencedate | FEB 26-29, 2024 | |
dc.source.conferencelocation | San Jose | |
dc.source.journal | Proceedings of SPIE | |
dc.source.volume | 12954 | |
imec.availability | Published - open access |