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Metal Etch Depth Metrology using YieldStar and CDSEM

dc.contributor.authorAnunciado, Roy
dc.contributor.authorAliaj, Ilirjan
dc.contributor.authorvan Haren, Richard
dc.contributor.authorTruffert, Vincent
dc.contributor.authorMoussa, Alain
dc.contributor.authorGoossens, Danny
dc.contributor.authorTamaddon, Amir-Hossein
dc.date.accessioned2025-06-05T09:45:11Z
dc.date.available2024-07-31T17:43:17Z
dc.date.available2025-06-05T09:45:11Z
dc.date.issued2024
dc.identifier.isbn979-8-3503-8456-7
dc.identifier.issn1078-8743
dc.identifier.otherWOS:001245033700070
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/44234.2
dc.sourceWOS
dc.titleMetal Etch Depth Metrology using YieldStar and CDSEM
dc.typeProceedings paper
dc.contributor.imecauthorTruffert, Vincent
dc.contributor.imecauthorMoussa, Alain
dc.contributor.imecauthorGoossens, Danny
dc.contributor.imecauthorTamaddon, Amir-Hossein
dc.contributor.orcidimecTruffert, Vincent::0000-0001-7851-830X
dc.contributor.orcidimecMoussa, Alain::0000-0002-6377-4199
dc.contributor.orcidimecGoossens, Danny::0009-0005-6087-6308
dc.contributor.orcidimecTamaddon, Amir-Hossein::0000-0003-4566-0697
dc.identifier.doi10.1109/ASMC61125.2024.10545490
dc.identifier.eisbn979-8-3503-8455-0
dc.source.numberofpages4
dc.source.peerreviewyes
dc.source.conference35th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
dc.source.conferencedateMAY 13-16, 2024
dc.source.conferencelocationAlbany
dc.source.journalN/A
imec.availabilityPublished - imec


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220.500.12860/44234.2*2025-06-05T09:44:24Zvalidation by library/open access desk
120.500.12860/442342024-07-31T17:43:17Z

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