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Charge trapping in SiOx/ZrO2 gate dielectric stacks

dc.contributor.authorHoussa, Michel
dc.contributor.authorNaili, Mohamed
dc.contributor.authorHeyns, Marc
dc.contributor.authorStesmans, Andre
dc.date.accessioned2021-10-14T13:05:00Z
dc.date.available2021-10-14T13:05:00Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4437
dc.sourceIIOimport
dc.titleCharge trapping in SiOx/ZrO2 gate dielectric stacks
dc.typeProceedings paper
dc.contributor.imecauthorHoussa, Michel
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorStesmans, Andre
dc.contributor.orcidimecHoussa, Michel::0000-0003-1844-3515
dc.source.peerreviewno
dc.source.beginpage230
dc.source.endpage231
dc.source.conferenceProceedings of the International Conference on Solid State Devices and Materials; Sendai, Japan.
dc.source.conferencelocation
imec.availabilityPublished - imec


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