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Impact of the Oxide Aperture Width on the Degradation of 845 Nm VCSELs for Silicon Photonics
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Impact of the Oxide Aperture Width on the Degradation of 845 Nm VCSELs for Silicon Photonics
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Date
2025-MAR-APR
Journal article
https://doi.org/10.1109/JSTQE.2024.3415674
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Zenari, Michele
;
Buffolo, Matteo
;
Rampazzo, Fabiana
;
De Santi, Carlo
;
Rossi, Francesca
;
Lazzarini, Laura
;
Goyvaerts, Jeroen
;
Grabowski, Alexander
;
Gustavsson, Johan S.
;
Baets, Roel
;
Larsson, Anders
;
Roelkens, Gunther
;
Meneghesso, Gaudenzio
;
Zanoni, Enrico
;
Meneghini, Matteo
Journal
IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS
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391
since deposited on 2024-09-18
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Acq. date: 2026-01-10
Citations
Metrics
Views
391
since deposited on 2024-09-18
3
last month
1
last week
Acq. date: 2026-01-10
Citations