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Exploring the optimal combination of Ru/Ta bilayer mask stacks and illumination source shapes to mitigate mask 3D effects at high-NA extreme ultraviolet lithography
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413 since deposited on 2024-11-16
32last month
9last week
Acq. date: 2026-10-10
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139 since deposited on 2024-11-16
4last month
1last week
Acq. date: 2026-10-10
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