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High NA EUV patterning ecosystem readiness to continue the logic scaling roadmap

dc.contributor.authorRonse, Kurt
dc.date.accessioned2025-07-07T14:22:49Z
dc.date.available2024-11-16T16:49:19Z
dc.date.available2025-07-07T14:22:49Z
dc.date.issued2024
dc.identifier.isbn978-1-5106-8288-7
dc.identifier.issn0277-786X
dc.identifier.otherWOS:001327624200002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/44793.2
dc.sourceWOS
dc.titleHigh NA EUV patterning ecosystem readiness to continue the logic scaling roadmap
dc.typeProceedings paper
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.identifier.doi10.1117/12.3030694
dc.identifier.eisbn978-1-5106-8289-4
dc.source.numberofpages7
dc.source.peerreviewyes
dc.source.beginpageArt. 1327304
dc.source.conference39th European Mask and Lithography Conference (EMLC)
dc.source.conferencedateJUN 17-19, 2024
dc.source.conferencelocationGrenoble
dc.source.journalProceedings of SPIE
dc.source.volume13273
imec.availabilityPublished - imec


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220.500.12860/44793.2*2025-07-07T14:21:56Zvalidation by library/open access desk
120.500.12860/447932024-11-16T16:49:19Z

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