High NA EUV patterning ecosystem readiness to continue the logic scaling roadmap

Thumbnail
Metadata
Show full item record
Authors
Ronse, Kurt
DOI
10.1117/12.3030694
EISBN
978-1-5106-8289-4
ISBN
978-1-5106-8288-7
ISSN
0277-786X
Conference
39th European Mask and Lithography Conference (EMLC)
Journal
Proceedings of SPIE
Volume
13273
Title
High NA EUV patterning ecosystem readiness to continue the logic scaling roadmap
Publication type
Proceedings paper
Collections

Version history

VersionItemDateSummary
220.500.12860/44793.2*2025-07-07T14:21:56Zvalidation by library/open access desk
120.500.12860/447932024-11-16T16:49:19Z

*Selected version