Browsing by author "Ronse, Kurt"
Now showing items 1-20 of 225
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0.18 μm KrF lithography using optical proximity correction based on empirical behavior modeling
Tritchkov, Alexander; Stirnimann, J.; Gangala, Hareen K; Ronse, Kurt (1998) -
157nm full field imaging
Hermans, Jan; Van Roey, Frieda; Van Den Heuvel, Dieter; Goethals, Mieke; Ronse, Kurt (2003-08) -
157nm resist process performance and integration challenges on a full field scanner
Goethals, Mieke; Gronheid, Roel; List, Scott; Ercken, Monique; Van Roey, Frieda; Van Den Heuvel, Dieter; Locorotondo, Sabrina; Ronse, Kurt (2004) -
193 nm lithography on a full field scanner
Goethals, Mieke; Pollers, Ingrid; Jaenen, Patrick; Van Roey, Frieda; Ronse, Kurt; Heskamp, B.; Davies, G. (1999) -
248 nm lithography for the 0.18 μm generation
Vandenberghe, Geert; Tzviatkov, Plamen; Yen, Anthony; Ronse, Kurt; Van den hove, Luc; Luehrmann, P.; Slonaker, S.; van Ingen Schenau, K.; Juffermans, Casper (1996) -
248nm and 193nm lithography for damascene patterning
Maenhoudt, Mireille; Pollentier, Ivan; Wiaux, Vincent; Vangoidsenhoven, Diziana; Ronse, Kurt (2001) -
28nm pitch single exposure patterning readiness by metal oxide resist on 0.33NA EUV Lithography
Kim, Il Hwan; Kim, Insung; Park, Changmin; Lee, Jsiun; Ryu, Koungmin; De Schepper, P.; Doise, J.; Kocsis, M.; De Simone, Danilo; Kljucar, Luka; Das, Poulomi; Blanc, Romuald; Beral, Christophe; Severi, Joren; Vandenbroeck, Nadia; Foubert, Philippe; Charley, Anne-Laure; Oak, Apoorva; Xu, Dongbo; Gillijns, Werner; Mitard, Jerome; Tokei, Zsolt; van der Veen, Marleen; Heylen, Nancy; Teugels, Lieve; Le, Quoc Toan; Schleicher, Filip; Leray, Philippe; Ronse, Kurt (2021) -
32nm node technology development using interference immersion lithography
Sewell, H.; McCafferty, D.; Markoya, L.; Hendrickx, Eric; Hermans, Jan; Ronse, Kurt (2005) -
A 0.314mm2 6T-SRAM cell built with tall triple-gate devices for 45nm node applications using 0.75NA 193nm lithography
Nackaerts, Axel; Ercken, Monique; Demuynck, Steven; Lauwers, Anne; Baerts, Christina; Bender, Hugo; Boullart, Werner; Collaert, Nadine; Degroote, Bart; Delvaux, Christie; de Marneffe, Jean-Francois; Dixit, Abhisek; De Meyer, Kristin; Hendrickx, Eric; Heylen, Nancy; Jaenen, Patrick; Laidler, David; Locorotondo, Sabrina; Maenhoudt, Mireille; Moelants, Myriam; Pollentier, Ivan; Ronse, Kurt; Rooyackers, Rita; Van Aelst, Joke; Vandenberghe, Geert; Vandervorst, Wilfried; Vandeweyer, Tom; Vanhaelemeersch, Serge; Van Hove, Marleen; Van Olmen, Jan; Verhaegen, Staf; Versluijs, Janko; Vrancken, Christa; Wiaux, Vincent; Jurczak, Gosia; Biesemans, Serge (2004-12) -
A yield prediction model and cost of ownership for productivity enhancement beyond imec 5nm technology node
Tsai, Yi-Pei; Chang, Yi-Han; Wang, Jane; Trivkovic, Darko; Ronse, Kurt; Kim, Ryan Ryoung han (2022) -
Achievements and concerns of 193 nm immersion lithography
Ronse, Kurt; Vandenberghe, Geert; Van den hove, Luc (2005) -
Additional evidence of EUV blank defects first seen by wafer printing
Jonckheere, Rik; Van Den Heuvel, Dieter; Hendrickx, Eric; Ronse, Kurt; Bret, Tristan; Hofmann, Thorsten; Magana, John; Aharonson, Israel; Meshulach, Doron (2011) -
Advanced photoresists for 193 nm lithography
Goethals, Mieke; Ronse, Kurt (1999) -
Analysis of advanced technology nodes and h-NA EUV introduction: a cost perspective
Mirabelli, Gioele; Wang, Jane; Trivkovic, Darko; Weckx, Pieter; Spessot, Alessio; Ronse, Kurt; Kim, Ryan Ryoung han; Hellings, Geert; Ryckaert, Julien (2021) -
Analysis of the impact of reticle CD variations on the available process windows for a 100nm CMOS process
Verhaegen, Staf; Vandenberghe, Geert; Jonckheere, Rik; Ronse, Kurt (2002) -
Application of a new approach to optical proximity correction
Rosenbusch, A.; Hourd, A.; Juffermans, Casper; Kirsch, H.; Lalanne, F.; Maurer, W.; Romeo, C.; Ronse, Kurt; Schiavone, P.; Simecek, M.; Toublan, O.; Vermeulen, Tom; Watson, J.; Ziegler, W.; Zimmerman, R. (1999) -
ArF lithography for the 130 and 100nm technology nodes
Ronse, Kurt (2000) -
ArF lithography options for 100-nm technologies
Vandenberghe, Geert; Kim, Young-Chang; Delvaux, Christie; Lucas, Kevin; Choi, Sang-Jun; Ercken, Monique; Ronse, Kurt; Vleeming, Bert (2001) -
ArF lithography options for 100nm technologies
Vandenberghe, Geert; Kim, Young-Chang; Delvaux, Christie; Lucas, Kevin; Choi, Sang-Jun; Ercken, Monique; Ronse, Kurt; Vleeming, Bert (2001) -
ArF lithography with combination of moderate OAI and attenuated PSM
Kim, Young-Chang; Vandenberghe, Geert; Verhaegen, Staf; Ronse, Kurt (2001)