Publication:

Study of mask error enhancement factor improvement with low-n absorber extreme ultraviolet lithography mask

Date

2024
Journal article
https://doi.org/10.1117/1.JMM.23.4.044401
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Author(s)

Takahata, Yosuke
;
Kovalevich, Tatiana  
;
De Simone, Danilo  
;
Tanaka, Yusuke
;
Philipsen, Vicky  

Journal

JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3

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44 since deposited on 2025-01-09
Acq. date: 2026-04-05

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44 since deposited on 2025-01-09
Acq. date: 2026-04-05

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