Authors

Li, Hua; Jin, S.; Bender, Hugo; Lanckmans, Filip; Heyvaert, Ilse; Maex, Karen; Froyen, L.

Issue

1

Journal

J. Vacuum Science and Technology B

Volume

B18

Title

Characterization of WF6/N2/H2 plasma enhanced chemical vapor deposited WxN films as barriers for Cu metallization

Publication type

Journal article

Embargo date

9999-12-31