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Resolving nanoscale composition fluctuations and defects in advanced interconnects: a crucial step to comprehend thin film resistivity.

dc.contributor.authorFleischmann, Claudia
dc.contributor.authorUedono, Akira
dc.contributor.authorScheerder, Jeroen
dc.contributor.authorSoulie, Jean-Philippe
dc.contributor.authorPark, Seongho
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorTokei, Zsolt
dc.date.accessioned2025-04-10T14:08:30Z
dc.date.available2025-03-06T20:45:27Z
dc.date.available2025-04-10T14:08:30Z
dc.date.issued2024
dc.identifier.isbn979-8-3503-8518-2
dc.identifier.issn2380-632X
dc.identifier.otherWOS:001411360600044
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45316.2
dc.sourceWOS
dc.titleResolving nanoscale composition fluctuations and defects in advanced interconnects: a crucial step to comprehend thin film resistivity.
dc.typeProceedings paper
dc.contributor.imecauthorFleischmann, Claudia
dc.contributor.imecauthorSoulie, Jean-Philippe
dc.contributor.imecauthorPark, Seongho
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorScheerder, Jeroen
dc.contributor.orcidimecFleischmann, Claudia::0000-0003-1531-6916
dc.contributor.orcidimecSoulie, Jean-Philippe::0000-0002-5956-6485
dc.contributor.orcidimecPark, Seongho::0000-0002-1058-9424
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecTokei, Zsolt::0000-0003-3545-3424
dc.contributor.orcidimecScheerder, Jeroen::0000-0002-9301-0392
dc.identifier.doi10.1109/IITC61274.2024.10732594
dc.identifier.eisbn979-8-3503-8517-5
dc.source.numberofpages3
dc.source.peerreviewyes
dc.source.conference2024 International Interconnect Technology Conference
dc.source.conferencedateJUN 03-06, 2024
dc.source.conferencelocationSan Jose
dc.source.journalN/A
imec.availabilityPublished - imec


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220.500.12860/45316.2*2025-04-10T14:06:27Zvalidation by library/open access desk
120.500.12860/453162025-03-06T20:45:27Z

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