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Optimized thermal processing for Ti-capped CoSi2 for 0.13μm technology

dc.contributor.authorLindsay, Richard
dc.contributor.authorLauwers, A.
dc.contributor.authorde Potter de ten Broeck, Muriel
dc.contributor.authorRoelandts, Nico
dc.contributor.authorVrancken, Christa
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-14T13:16:42Z
dc.date.available2021-10-14T13:16:42Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4535
dc.sourceIIOimport
dc.titleOptimized thermal processing for Ti-capped CoSi2 for 0.13μm technology
dc.typeOral presentation
dc.contributor.imecauthorde Potter de ten Broeck, Muriel
dc.contributor.imecauthorVrancken, Christa
dc.contributor.imecauthorMaex, Karen
dc.source.peerreviewno
dc.source.conferenceMaterials for Advanced Metallization Conference - MAM; February 28 - March 1, 2000; Stresa, Italy.
dc.source.conferencelocation
imec.availabilityPublished - imec


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