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OPC and Modeling Solution to Support 0.55NA EUV Stitching

dc.contributor.authorZeng, Qinglin
dc.contributor.authorXu, Dongbo
dc.contributor.authorZeng, Xuefeng
dc.contributor.authorGillijns, Werner
dc.contributor.authorTejnil, Edita
dc.contributor.authorSun, Yuyang
dc.contributor.authorFenger, Germain
dc.date.accessioned2025-06-17T12:09:03Z
dc.date.available2025-05-11T05:43:39Z
dc.date.available2025-06-17T12:09:03Z
dc.date.issued2024
dc.identifier.isbn978-1-5106-8155-2
dc.identifier.issn0277-786X
dc.identifier.otherWOS:001467876500006
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45642.2
dc.sourceWOS
dc.titleOPC and Modeling Solution to Support 0.55NA EUV Stitching
dc.typeProceedings paper
dc.contributor.imecauthorGillijns, Werner
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.identifier.doi10.1117/12.3034957
dc.identifier.eisbn978-1-5106-8156-9
dc.source.numberofpages8
dc.source.peerreviewyes
dc.source.beginpageArt. 1321507
dc.source.conference2024 International Conference on Extreme Ultraviolet Lithography
dc.source.conferencedateSEP 30-OCT 03, 2024
dc.source.conferencelocationMonterey
dc.source.journalProceedings of SPIE
dc.source.volume13215
imec.availabilityPublished - imec
dc.description.wosFundingTextThis work is partially founded by the European Union by 10ACE (Project: 101139972 - 10ACe - HORIZON-KDT-JU-2023-1-IA). Views and opinions expressed are however those of the author(s) only and do not necessarily reflect those of the European Union or the Chips Joint Undertaking. Neither the European Union nor the granting authority can be held responsible for them.


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