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BEFORCE: a pathway to unravel metal oxide resist (MOR) reactions upon EUV exposure, bake, and environment

dc.contributor.authorPollentier, Ivan
dc.contributor.authorHolzmeier, Fabian
dc.contributor.authorDorney, Kevin
dc.contributor.authorSuh, Hyo Seon
dc.date.accessioned2025-07-07T09:09:26Z
dc.date.available2025-05-11T05:43:39Z
dc.date.available2025-07-07T09:09:26Z
dc.date.issued2024
dc.identifier.isbn978-1-5106-8155-2
dc.identifier.issn0277-786X
dc.identifier.otherWOS:001467876500015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45644.2
dc.sourceWOS
dc.titleBEFORCE: a pathway to unravel metal oxide resist (MOR) reactions upon EUV exposure, bake, and environment
dc.typeProceedings paper
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorHolzmeier, Fabian
dc.contributor.imecauthorDorney, Kevin
dc.contributor.imecauthorSuh, Hyo Seon
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecHolzmeier, Fabian::0000-0001-8749-5330
dc.contributor.orcidimecDorney, Kevin::0000-0003-2097-6994
dc.contributor.orcidimecSuh, Hyo Seon::0000-0003-4370-5062
dc.identifier.doi10.1117/12.3034708
dc.identifier.eisbn978-1-5106-8156-9
dc.source.numberofpages6
dc.source.peerreviewyes
dc.source.beginpageArt. 132150G
dc.source.conference2024 International Conference on Extreme Ultraviolet Lithography
dc.source.conferencedateSEP 30-OCT 03, 2024
dc.source.conferencelocationMonterey
dc.source.journalProceedings of SPIE
dc.source.volume13215
imec.availabilityPublished - imec


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220.500.12860/45644.2*2025-07-07T09:08:15Zvalidation by library/open access desk
120.500.12860/456442025-05-11T05:43:39Z

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