Publication:

Substantial Dose Reduction Using Dry Deposited Underlayer for EUV Lithography While Maintaining Roughness and Minimizing Defects

Date

2024

Proceedings Paper

https://doi.org/10.1117/12.3034575

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Author(s)

Kundu, Achintya

;

;

De Simone, Danilo

;

Vanelderen, Pieter

;

;

De Roest, David

;

Christy, Dennis

;

Davodi, Fatemeh

;

;

Wallace, Steaphan

;

;

Journal

Proceedings of SPIE

Statistics

141 since deposited on 2025-05-11

Acq. date: 2026-04-26