Substantial Dose Reduction Using Dry Deposited Underlayer for EUV Lithography While Maintaining Roughness and Minimizing Defects

Kundu, Achintya; Gupta, Mihir; De Simone, Danilo; Vanelderen, Pieter; Suh, Hyo Seon; De Roest, David; Christy, Dennis; Davodi, Fatemeh; Patel, Kishan; Wallace, Steaphan; Sun, Yiting; Tomczak, Yoann

doi:10.1117/12.3034575

Publication:

Substantial Dose Reduction Using Dry Deposited Underlayer for EUV Lithography While Maintaining Roughness and Minimizing Defects

Date

2024

Proceedings Paper

https://doi.org/10.1117/12.3034575

Simple item page Full metadata Statistics

Author(s)

;

;

;

;

;

;

;

;

;

;

;

Journal

Proceedings of SPIE

Statistics

141 since deposited on 2025-05-11

1last month

1last week

Acq. date: 2026-02-25

Substantial Dose Reduction Using Dry Deposited Underlayer for EUV Lithography While Maintaining Roughness and Minimizing Defects

Date

Author(s)

Journal

Abstract

Description

Statistics

Views

Citations

Statistics

Views

Citations