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Enabling 0.33NA EUV lithography patterning towards MP16 SADP semi-damascene metallization, setting the benchmark for High-NA EUV
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Enabling 0.33NA EUV lithography patterning towards MP16 SADP semi-damascene metallization, setting the benchmark for High-NA EUV
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Date
2024
Proceedings Paper
https://doi.org/10.1117/12.3034200
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Hermans, Yannick
;
Decoster, Stefan
;
Wu, Chen
;
Doise, Jan
;
Renaud, Vincent
;
Van den Heuvel, Dieter
;
Park, Seongho
;
Rincon Delgadillo, Paulina
;
Tokei, Zsolt
Journal
N/A
Abstract
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146
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Acq. date: 2025-12-12
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Metrics
Views
146
since deposited on 2025-05-11
1
last month
Acq. date: 2025-12-12
Citations