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A high-performance drying method enabling clustered single wafer wet cleaning

dc.contributor.authorMertens, Paul
dc.contributor.authorDoumen, Geert
dc.contributor.authorLauerhaas, Jeff
dc.contributor.authorKenis, Karine
dc.contributor.authorFyen, Wim
dc.contributor.authorMeuris, Marc
dc.contributor.authorArnauts, Sophia
dc.contributor.authorDevriendt, Katia
dc.contributor.authorVos, Rita
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-14T13:22:36Z
dc.date.available2021-10-14T13:22:36Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4580
dc.sourceIIOimport
dc.titleA high-performance drying method enabling clustered single wafer wet cleaning
dc.typeProceedings paper
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorDoumen, Geert
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorDevriendt, Katia
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.contributor.orcidimecDevriendt, Katia::0000-0002-0662-7926
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage56
dc.source.endpage57
dc.source.conferenceSymposium on VLSI Technology. Digest of Technical Papers
dc.source.conferencedate13/06/2000
dc.source.conferencelocationHonolulu, HI USA
imec.availabilityPublished - open access


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