dc.contributor.author | Meuris, Marc | |
dc.contributor.author | Arnauts, Sophia | |
dc.contributor.author | Cornelissen, Ingrid | |
dc.contributor.author | Kenis, Karine | |
dc.contributor.author | Lux, Marcel | |
dc.contributor.author | De Gendt, Stefan | |
dc.contributor.author | Mertens, Paul | |
dc.contributor.author | Teerlinck, Ivo | |
dc.contributor.author | Vos, Rita | |
dc.contributor.author | Loewenstein, Lee | |
dc.contributor.author | Heyns, Marc | |
dc.contributor.author | Wolke, K. | |
dc.date.accessioned | 2021-10-14T13:23:01Z | |
dc.date.available | 2021-10-14T13:23:01Z | |
dc.date.issued | 2000 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/4583 | |
dc.source | IIOimport | |
dc.title | The IMEC-Clean: A clean for advanced CMOS manufacturing | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | Meuris, Marc | |
dc.contributor.imecauthor | Arnauts, Sophia | |
dc.contributor.imecauthor | Cornelissen, Ingrid | |
dc.contributor.imecauthor | Kenis, Karine | |
dc.contributor.imecauthor | Lux, Marcel | |
dc.contributor.imecauthor | De Gendt, Stefan | |
dc.contributor.imecauthor | Mertens, Paul | |
dc.contributor.imecauthor | Vos, Rita | |
dc.contributor.imecauthor | Heyns, Marc | |
dc.contributor.orcidimec | Meuris, Marc::0000-0002-9580-6810 | |
dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
dc.source.peerreview | no | |
dc.source.conference | 7th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal; 19-21 June 2000; Newark, NJ, USA. | |
dc.source.conferencelocation | | |
imec.availability | Published - imec | |