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Improvement of EUV Contact Hole Pattern Rectification using Novel Directed Self-Assembly Materials
Publication:
Improvement of EUV Contact Hole Pattern Rectification using Novel Directed Self-Assembly Materials
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Date
2025
Proceedings Paper
https://doi.org/10.1117/12.3051492
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Kim, Dong-Ook
;
Kim, Jihoon
;
Kang, Namgoo
;
Her, Youngjun
;
Miyazaki, Shinji
;
Alperson, Boaz
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37
since deposited on 2025-07-31
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Acq. date: 2026-01-10
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Views
37
since deposited on 2025-07-31
2
last month
Acq. date: 2026-01-10
Citations