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Enabling chemically amplified resists towards tight pitch EUV patterning by directed self-assembly
Publication:
Enabling chemically amplified resists towards tight pitch EUV patterning by directed self-assembly
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Date
2025
Proceedings Paper
https://doi.org/10.1117/12.3051663
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Verstraete, Lander
;
Vallat, Remi
;
Van Bel, Julie
;
Job, Min-Gi
;
Bezard, Philippe
;
Suh, Hyo Seon
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Acq. date: 2026-01-10
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Views
38
since deposited on 2025-07-31
3
last month
1
last week
Acq. date: 2026-01-10
Citations