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OPC Model Accuracy of Dry Resist Readiness for 0.55NA EUVL by using Low-n Bright Field Mask
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OPC Model Accuracy of Dry Resist Readiness for 0.55NA EUVL by using Low-n Bright Field Mask
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Date
2025
Proceedings Paper
https://doi.org/10.1117/12.3051855
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Xu, Dongbo
;
Gillijns, Werner
;
Jambaldinni, Shruti
;
Hwang, Soobin
;
De Silva, Anuja
;
Fenger, Germain
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37
since deposited on 2025-07-31
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last month
Acq. date: 2026-01-10
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Metrics
Views
37
since deposited on 2025-07-31
2
last month
Acq. date: 2026-01-10
Citations