Influence of Wafer Topography on Focus Control and Defectivity in EUV Lithography

Gronheid, Roel; Ren, Huan; Cheng, Guojie; Sah, Kaushik; Gao, Xu; Tang, Weiwei; Chen, Zhijin; Zafar, Khurram; Groeger, Philip; Bald, Holger; Beaufort, Gaetan De Liedekerke; Habets, Boris; Lariviere, Stephane; Baudemprez, Bart; Sebaai, Farid

doi:10.1117/12.3051869

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Influence of Wafer Topography on Focus Control and Defectivity in EUV Lithography

Date

2025

Proceedings Paper

https://doi.org/10.1117/12.3051869

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Beaufort, Gaetan De Liedekerke

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Proceedings of SPIE

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51 since deposited on 2025-07-31

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Acq. date: 2026-05-29

Influence of Wafer Topography on Focus Control and Defectivity in EUV Lithography

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