Publication:

Influence of Wafer Topography on Focus Control and Defectivity in EUV Lithography

Date

2025

Proceedings Paper

https://doi.org/10.1117/12.3051869

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Author(s)

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Groeger, Philip

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Beaufort, Gaetan De Liedekerke

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Lariviere, Stephane

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Baudemprez, Bart

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Metrics

37 since deposited on 2025-07-31

2last month

Acq. date: 2026-01-09