Demonstration of lithium niobate integration on a 200-mm silicon photonics wafer using transfer printing

Abstract

We present a scalable approach for the heterogeneous integration of lithium niobate onto silicon photonics platforms using wafer-scale micro-transfer printing. This approach enables the incorporation of efficient, high-speed modulators while maintaining compatibility with back-end processing. Electro-optic modulators with a length of 7 mm, fabricated with this technology, achieve a half-wave voltage of 4 V and a bandwidth exceeding 70 GHz. Furthermore, as proof of concept, we demonstrate the integration of more than 200 lithium niobate photonic structures directly on a 200-mm wafer and characterize their passive optical properties.