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Articles
Study on Next-Generation EUV Lithography Technology: Hyper NA, the Highest Potential for Practical Implementation
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Study on Next-Generation EUV Lithography Technology: Hyper NA, the Highest Potential for Practical Implementation
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Date
2025-AUG 11
Journal article
https://doi.org/10.1021/acsami.5c11891
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Lee, Inhwan
;
Franke, Joern-Holger
;
Philipsen, Vicky
;
Ronse, Kurt
;
De Gendt, Stefan
;
Hendrickx, Eric
Journal
ACS APPLIED MATERIALS & INTERFACES
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since deposited on 2025-08-28
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Acq. date: 2026-01-07
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20
since deposited on 2025-08-28
2
last month
Acq. date: 2026-01-07
Citations