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Novel metrology for mask degradation: IR-AFM, XPS depth profiling and HAXPES
Publication:
Novel metrology for mask degradation: IR-AFM, XPS depth profiling and HAXPES
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Date
2024
Proceedings Paper
https://doi.org/10.1117/12.3032757
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
de Rooij-Lohmann, Veronique
;
Mukherjee, Shriparna
;
Wu, Chien-Ching
;
Ebeling, Rob
;
Pandey, Komal
;
van Es, Maarten
;
Jonckheere, Rik
Journal
Proceedings of SPIE
Abstract
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15
since deposited on 2025-08-29
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Acq. date: 2026-01-09
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Views
15
since deposited on 2025-08-29
3
last month
Acq. date: 2026-01-09
Citations