Publication:

Novel metrology for mask degradation: IR-AFM, XPS depth profiling and HAXPES

Date

2024
Proceedings Paper
https://doi.org/10.1117/12.3032757
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Author(s)

de Rooij-Lohmann, Veronique
;
Mukherjee, Shriparna
;
Wu, Chien-Ching
;
Ebeling, Rob
;
Pandey, Komal
;
van Es, Maarten
;
Jonckheere, Rik  

Journal

Proceedings of SPIE

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20 since deposited on 2025-08-29
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