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A study on programmed defect propagation from design to mask to wafer using SEM metrology
Publication:
A study on programmed defect propagation from design to mask to wafer using SEM metrology
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Date
2024
Proceedings Paper
https://doi.org/10.1117/12.3035709
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Baskaran, Balakumar
;
Saib, Mohamed
;
Reddy, Bojja Aditya
;
Beggiato, Matteo
;
Gupta, Mihir
;
Beral, Christophe
;
Charley, Anne-Laure
;
Lorusso, Gian
;
Bekaert, Joost
;
Leray, Philippe
Journal
Proceedings of SPIE
Abstract
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14
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Acq. date: 2026-01-10
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14
since deposited on 2025-08-29
1
last month
Acq. date: 2026-01-10
Citations