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Conference contributions
Logic and memory patterning breakthrough using High-NA lithography
Publication:
Logic and memory patterning breakthrough using High-NA lithography
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Date
2024
Proceedings Paper
https://doi.org/10.1117/12.3047176
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Blanco, Victor
;
Roy, S.
;
Chowrira, B.
;
Pham, Van Tuong
;
Wouters, J.
;
Das, S.
;
Decoster, Stefan
;
Leray, Philippe
;
Liu, Ru-Gun
;
Ronse, Kurt
;
Vandenberghe, Geert
;
Niroomand, Ardavan
;
Foubert, Philippe
;
Rutigliani, V. D.
;
Suh, Hyo Seon
;
Gupta, Mihir
;
De Simone, Danilo
;
Dusa, Mircea
;
Beral, Christophe
;
Philipsen, Vicky
;
Wiaux, Vincent
;
Franke, Joern-Holger
;
Bekaert, Joost
;
Baskaran, Balakumar
;
Gillijns, Werner
;
Kim, Ryan Ryoung Han
;
Sherazi, Yasser
;
Vats, H.
;
Cupak, Miroslav
;
Chang, C.
;
Lin, Y.-J.
;
Lee, J.
;
Hwang, Soobin
;
Yang, Kiho
;
Miyaguchi, Kenichi
Journal
Proceedings of SPIE
Abstract
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12
since deposited on 2025-08-29
Acq. date: 2026-01-09
Citations
Metrics
Views
12
since deposited on 2025-08-29
Acq. date: 2026-01-09
Citations