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The influence of reflectivity on EUV lithography performance of low-n and binary masks for random logic via implementation
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The influence of reflectivity on EUV lithography performance of low-n and binary masks for random logic via implementation
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Date
2024
Proceedings Paper
https://doi.org/10.1117/12.3034348
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Tan, Ling Ee
;
Treska, Fergo
;
Gillijns, Werner
;
Van de Kerkhove, Jeroen
;
De Bisschop, Peter
;
Philipsen, Vicky
;
Kim, Ryan Ryoung Han
Journal
Proceedings of SPIE
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19
since deposited on 2025-08-29
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Acq. date: 2026-01-06
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Views
19
since deposited on 2025-08-29
2
last month
Acq. date: 2026-01-06
Citations