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Multi-step trap-assisted tunneling in Al-doped HfO<sub>2</sub> used in advanced 2.5D metal-insulator-metal capacitors
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Multi-step trap-assisted tunneling in Al-doped HfO<sub>2</sub> used in advanced 2.5D metal-insulator-metal capacitors
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Date
2025-AUG 21
Journal article
https://doi.org/10.1063/5.0277092
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Fohn, C.
;
Chery, E.
;
Croes, K.
;
Stucchi, M.
;
Afanas'ev, V.
Journal
JOURNAL OF APPLIED PHYSICS
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9
since deposited on 2025-09-01
2
last month
Acq. date: 2026-01-09
Citations