dc.contributor.author | Nicolett, A. S. | |
dc.contributor.author | Martino, Joao Antonio | |
dc.contributor.author | Simoen, Eddy | |
dc.contributor.author | Claeys, C. | |
dc.date.accessioned | 2021-10-14T13:28:17Z | |
dc.date.available | 2021-10-14T13:28:17Z | |
dc.date.issued | 2000 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/4621 | |
dc.source | IIOimport | |
dc.title | A new method to extract the silicon film thickness of enhancement mode fully depleted SOI nMOSFETs at 300K | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | Simoen, Eddy | |
dc.contributor.orcidimec | Simoen, Eddy::0000-0002-5218-4046 | |
dc.source.peerreview | no | |
dc.source.conference | 1st Latin American Test Workshop; March 2000; Rio de Janeiro, Brasil. | |
dc.source.conferencelocation | | |
imec.availability | Published - imec | |