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Measurement and simulation of boron diffusivity in strained Si1-xGex epitaxial layers

dc.contributor.authorKrishnasamy, Rajendran
dc.contributor.authorSchoenmaker, Wim
dc.date.accessioned2021-10-14T13:37:46Z
dc.date.available2021-10-14T13:37:46Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4685
dc.sourceIIOimport
dc.titleMeasurement and simulation of boron diffusivity in strained Si1-xGex epitaxial layers
dc.typeProceedings paper
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage108
dc.source.endpage109
dc.source.conferenceProceedings of the 7th International Workshop on Computational Electronics - IWCE
dc.source.conferencedate22/05/2000
dc.source.conferencelocationGlasgow UK
imec.availabilityPublished - open access


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