dc.contributor.author | Krishnasamy, Rajendran | |
dc.contributor.author | Schoenmaker, Wim | |
dc.contributor.author | Decoutere, Stefaan | |
dc.contributor.author | Caymax, Matty | |
dc.date.accessioned | 2021-10-14T13:37:55Z | |
dc.date.available | 2021-10-14T13:37:55Z | |
dc.date.issued | 2000 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/4686 | |
dc.source | IIOimport | |
dc.title | Simulation of boron diffusion in strained Si1-xGex epitaxial layers | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Decoutere, Stefaan | |
dc.contributor.imecauthor | Caymax, Matty | |
dc.contributor.orcidimec | Decoutere, Stefaan::0000-0001-6632-6239 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 206 | |
dc.source.endpage | 209 | |
dc.source.conference | Proceedings of the International Conference on Simulation of Semiconductor Processes and Devices - SISPAD | |
dc.source.conferencedate | 6/09/2000 | |
dc.source.conferencelocation | Seattle, WA USA | |
imec.availability | Published - open access | |