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dc.contributor.authorRichard, Emmanuel
dc.contributor.authorVervoort, Iwan
dc.contributor.authorBrongersma, Sywert
dc.contributor.authorBender, Hugo
dc.contributor.authorBeyer, Gerald
dc.contributor.authorPalmans, Roger
dc.contributor.authorLagrange, Sébastien
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-14T13:38:48Z
dc.date.available2021-10-14T13:38:48Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4692
dc.sourceIIOimport
dc.titleRoles of additives during filling process of damascene structures with electrochemical deposited copper
dc.typeProceedings paper
dc.contributor.imecauthorBrongersma, Sywert
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecBrongersma, Sywert::0000-0002-1755-3897
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage149
dc.source.endpage153
dc.source.conferenceAdvanced Metallization Conference 1999 - AMC 1999
dc.source.conferencedate28/09/1999
dc.source.conferencelocationOrlando, FL USA
imec.availabilityPublished - open access


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