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Status of ArF lithography for the 130nm technology node

dc.contributor.authorRonse, Kurt
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorJaenen, Patrick
dc.contributor.authorDelvaux, Christie
dc.contributor.authorVangoidsenhoven, Diziana
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorPollers, Ingrid
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorGoethals, Mieke
dc.contributor.authorPollentier, Ivan
dc.contributor.authorVleeming, Bert
dc.contributor.authorvan Ingen Schenau, K.
dc.contributor.authorHeskamp, B.
dc.contributor.authorDavies, G.
dc.contributor.authorFinders, Jo
dc.contributor.authorNiroomand, Ardavan
dc.date.accessioned2021-10-14T13:41:21Z
dc.date.available2021-10-14T13:41:21Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4709
dc.sourceIIOimport
dc.titleStatus of ArF lithography for the 130nm technology node
dc.typeProceedings paper
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorJaenen, Patrick
dc.contributor.imecauthorDelvaux, Christie
dc.contributor.imecauthorVangoidsenhoven, Diziana
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage410
dc.source.conferenceOptical Microlithography XIII
dc.source.conferencedate1/03/2000
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 4000


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