dc.contributor.author | Steegen, An | |
dc.contributor.author | Lauwers, Anne | |
dc.contributor.author | de Potter de ten Broeck, Muriel | |
dc.contributor.author | Badenes, Gonçal | |
dc.contributor.author | Rooyackers, Rita | |
dc.contributor.author | Maex, Karen | |
dc.date.accessioned | 2021-10-14T13:50:41Z | |
dc.date.available | 2021-10-14T13:50:41Z | |
dc.date.issued | 2000 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/4770 | |
dc.source | IIOimport | |
dc.title | Silicide and shallow trench isolation line width dependent stress induced junction leakage | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Lauwers, Anne | |
dc.contributor.imecauthor | de Potter de ten Broeck, Muriel | |
dc.contributor.imecauthor | Maex, Karen | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 180 | |
dc.source.endpage | 181 | |
dc.source.conference | Symposium on VLSI Technology. Digest of Technical Papers | |
dc.source.conferencedate | 13/06/2000 | |
dc.source.conferencelocation | Honolulu, HI USA | |
imec.availability | Published - open access | |