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Elimination of HF-last cleaning related CoSi2 defects formation

dc.contributor.authorZou, Gang
dc.contributor.authorJonckx, Franky
dc.contributor.authorAlves Donaton, Ricardo
dc.contributor.authorKuper, Werner
dc.contributor.authorMaex, Karen
dc.contributor.authorMertens, Paul
dc.contributor.authorMeuris, Marc
dc.contributor.authorHeyns, Marc
dc.contributor.authorLocke, Klaus
dc.contributor.authorKorac, M.
dc.contributor.authorSchild, R.
dc.date.accessioned2021-09-29T12:54:27Z
dc.date.available2021-09-29T12:54:27Z
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/478
dc.sourceIIOimport
dc.titleElimination of HF-last cleaning related CoSi2 defects formation
dc.typeProceedings paper
dc.contributor.imecauthorMaex, Karen
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage177
dc.source.endpage180
dc.source.conferenceProceedings of the 2nd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
dc.source.conferencedate19/09/1994
dc.source.conferencelocationBrugge Belgium
imec.availabilityPublished - open access


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