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New drying techology for advanced cleaning in IC manufacturing

dc.contributor.authorMeuris, Marc
dc.contributor.authorMertens, Paul
dc.contributor.authorSchmidt, Harald
dc.contributor.authorHurd, Trace
dc.contributor.authorLi, Li
dc.contributor.authorHeyns, Marc
dc.contributor.authorJonckx, Franky
dc.contributor.authorMaex, Karen
dc.contributor.authorSchild, R.
dc.contributor.authorLocke, K.
dc.contributor.authorKozak, M.
dc.date.accessioned2021-09-29T12:54:44Z
dc.date.available2021-09-29T12:54:44Z
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/483
dc.sourceIIOimport
dc.titleNew drying techology for advanced cleaning in IC manufacturing
dc.typeProceedings paper
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceVacuum and Semiconductor Processing Conference
dc.source.conferencedate15/06/1994
dc.source.conferencelocationMünchen Germany
imec.availabilityPublished - open access


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