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Ultra-shallow junction profiling

dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorClarysse, Trudo
dc.contributor.authorDuhayon, Natasja
dc.contributor.authorEyben, Pierre
dc.contributor.authorHantschel, Thomas
dc.contributor.authorXu, Mingwei
dc.contributor.authorJanssens, Tom
dc.contributor.authorDe Witte, Hilde
dc.contributor.authorConard, Thierry
dc.contributor.authorDeleu, Jeroen
dc.contributor.authorBadenes, Gonçal
dc.date.accessioned2021-10-14T14:08:33Z
dc.date.available2021-10-14T14:08:33Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4880
dc.sourceIIOimport
dc.titleUltra-shallow junction profiling
dc.typeProceedings paper
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorDuhayon, Natasja
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorHantschel, Thomas
dc.contributor.imecauthorConard, Thierry
dc.contributor.orcidimecHantschel, Thomas::0000-0001-9476-4084
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage429
dc.source.endpage432
dc.source.conferenceIEDM Technical Digest
dc.source.conferencedate10/12/2000
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - open access
imec.internalnotes


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