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Dry etch and clean aspects for advanced integration of low k dielectrics

dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorStruyf, Herbert
dc.contributor.authorAlaerts, Carine
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorLepage, Muriel
dc.date.accessioned2021-10-14T14:10:18Z
dc.date.available2021-10-14T14:10:18Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4890
dc.sourceIIOimport
dc.titleDry etch and clean aspects for advanced integration of low k dielectrics
dc.typeOral presentation
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.source.peerreviewno
dc.source.conference5th International Symposium on Low and High Dielectric Constant Materials: Materials Science, Processing, and Reliability Issues
dc.source.conferencelocation
imec.availabilityPublished - imec


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