dc.contributor.author | Vanhaelemeersch, Serge | |
dc.contributor.author | Struyf, Herbert | |
dc.contributor.author | Alaerts, Carine | |
dc.contributor.author | Baklanov, Mikhaïl | |
dc.contributor.author | Lepage, Muriel | |
dc.date.accessioned | 2021-10-14T14:10:18Z | |
dc.date.available | 2021-10-14T14:10:18Z | |
dc.date.issued | 2000 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/4890 | |
dc.source | IIOimport | |
dc.title | Dry etch and clean aspects for advanced integration of low k dielectrics | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | Vanhaelemeersch, Serge | |
dc.contributor.imecauthor | Struyf, Herbert | |
dc.contributor.orcidimec | Vanhaelemeersch, Serge::0000-0003-2102-7395 | |
dc.source.peerreview | no | |
dc.source.conference | 5th International Symposium on Low and High Dielectric Constant Materials: Materials Science, Processing, and Reliability Issues | |
dc.source.conferencelocation | | |
imec.availability | Published - imec | |