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TXRF analysis of trace metals in thin silicon nitride films

dc.contributor.authorVereecke, Guy
dc.contributor.authorArnauts, Sophia
dc.contributor.authorVerstraeten, Karel
dc.contributor.authorSchaekers, Marc
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-14T14:13:06Z
dc.date.available2021-10-14T14:13:06Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4906
dc.sourceIIOimport
dc.titleTXRF analysis of trace metals in thin silicon nitride films
dc.typeMeeting abstract
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference8th Conference on Total Reflection X-Ray Fluorescence Analysis and Related Methods
dc.source.conferencedate25/09/2000
dc.source.conferencelocationVienna Austria
imec.availabilityPublished - open access


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