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Investigation of fluorine in dry ultrathin silicon oxides

dc.contributor.authorVereecke, Guy
dc.contributor.authorRöhr, Erika
dc.contributor.authorCarter, Richard
dc.contributor.authorConard, Thierry
dc.contributor.authorDe Witte, Hilde
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-14T14:13:27Z
dc.date.available2021-10-14T14:13:27Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4908
dc.sourceIIOimport
dc.titleInvestigation of fluorine in dry ultrathin silicon oxides
dc.typeOral presentation
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference47th International Sympsoium of the American Vacuum Society
dc.source.conferencedate2/10/2000
dc.source.conferencelocationBoston, MA USA
imec.availabilityPublished - open access


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