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Optimisation of dHF-based cleaning recipes: to remove or not to remove a particle?

dc.contributor.authorVos, Rita
dc.contributor.authorCornelissen, Ingrid
dc.contributor.authorMeuris, Marc
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-14T14:16:41Z
dc.date.available2021-10-14T14:16:41Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4927
dc.sourceIIOimport
dc.titleOptimisation of dHF-based cleaning recipes: to remove or not to remove a particle?
dc.typeProceedings paper
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorCornelissen, Ingrid
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage461
dc.source.endpage468
dc.source.conferenceCleaning Technology in Semiconductor Device Manufacturing. Proceedings of the 6th International Symposium
dc.source.conferencedate17/10/1999
dc.source.conferencelocationHonolulu, HI USA
imec.availabilityPublished - open access
imec.internalnotesElectrochemical Society Proceedings; Vol. PV 99-36


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