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A comparison between wet HF etching and vapor HF etching for sacrificial oxide removal

dc.contributor.authorWitvrouw, Ann
dc.contributor.authorDu Bois, Bert
dc.contributor.authorDe Moor, Piet
dc.contributor.authorVerbist, Agnes
dc.contributor.authorVan Hoof, Chris
dc.contributor.authorBender, Hugo
dc.contributor.authorBaert, Kris
dc.date.accessioned2021-10-14T14:19:52Z
dc.date.available2021-10-14T14:19:52Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4945
dc.sourceIIOimport
dc.titleA comparison between wet HF etching and vapor HF etching for sacrificial oxide removal
dc.typeProceedings paper
dc.contributor.imecauthorDu Bois, Bert
dc.contributor.imecauthorDe Moor, Piet
dc.contributor.imecauthorVan Hoof, Chris
dc.contributor.imecauthorBender, Hugo
dc.contributor.orcidimecDu Bois, Bert::0000-0003-0147-1296
dc.source.peerreviewno
dc.source.beginpage130
dc.source.endpage141
dc.source.conferenceMicromachining and Microfabrication Process Technology VI
dc.source.conferencedate17/09/2000
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 4174


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